Multi Project Wafer Service

The TriPleX™ waveguides offered within this MPW are designed for single polarization (TE) applications to operate at the telecom wavelength (1.55 µm). The waveguide however is also transparent for lower wavelengths. The TriPleX™ technology has applications from 405nm to 2.35µm. In addition, these waveguides show a low propagation loss (< 0.5 dB/cm @ 1.55µm). The high contrast waveguide allows bend radii of 125 micron, which makes large scale integration (VLSI) on chip possible. The coupling to and from a fiber from this high contrast waveguide is optimized by the addition of spot size converters , which expand the mode profile to the size of a standard telecom fiber, allowing low loss fiber chip coupling. The offered waveguides consist of an asymmetric  double stripe shown in Figure 2 using layers of Si3N4 with a high refractive index. Furthermore the cladding and core region consist of SiO2. The layer between the nitride stripes is also SiO2. The entire waveguide will be realized on 100 mm silicon wafers with 8 µm thermal oxide and thermo-optic phase shifters will be applied on top of the waveguide. The process includes a “ asymmetric double stripe” waveguide geometry, thermo-optic phase shifters and spot size converters and 4 dies will be supplied to the customer. [/av_textblock] [/av_two_third] [av_hr class='invisible' icon_select='yes' icon='ue808' font='entypo-fontello' position='center' shadow='no-shadow' height='25' custom_border='av-border-thin' custom_width='50px' custom_margin_top='30px' custom_margin_bottom='30px' custom_border_color='' custom_icon_color='' id='' custom_class='' av_uid='av-k74k9707' admin_preview_bg=''] [av_button label='For more details, please request our MPW Overview manual' icon_select='yes' icon='ue81f' font='entypo-fontello' size='medium' position='left' label_display='' title_attr='' color='theme-color' custom_bg='#444444' custom_font='#ffffff' link='manually,https://photonics.lionix-international.com/mpw-overview-manual/' link_target='_blank' id='' custom_class='' av_uid='av-k5qibeby' admin_preview_bg=''] [av_hr class='invisible' icon_select='yes' icon='ue808' font='entypo-fontello' position='center' shadow='no-shadow' height='25' custom_border='av-border-thin' custom_width='50px' custom_margin_top='30px' custom_margin_bottom='30px' custom_border_color='' custom_icon_color='' id='' custom_class='' av_uid='av-k74k9707' admin_preview_bg=''] [av_textblock size='' av-medium-font-size='' av-small-font-size='' av-mini-font-size='' font_color='' color='' id='' custom_class='' av_uid='av-2e2vp3' admin_preview_bg='']

TriPleX™ Background

In the last years the proprietary TriPleX™ waveguide technology of LioniX International has been further developed and has become one of the three main integrated optical platforms (besides InP and SOI) in the world. TriPleX™ structures are realized with CMOS compatible fabrication equipment and the materials used are based on chemical end products of LPCVD processes, resulting in very reproducible material properties, allowing design by geometry. The basic concept of a TriPleX™ waveguide consists of a multilayer stack of stoichiometric silicon nitride and silicon oxide. These materials have an opposite stress when deposited on a silicon wafer (nitride is tensile and oxide is compressive) and stacking them in a multilayer results in a macroscopically low stress layer stack. The fabrication process can be used to realize a variety of geometries. The differences are based on etchdepth, layerthickness and waveguide width. Three “standard” geometries are shown in Figure 3.